Heidelberg - Jena - Database of Optical Constants (HEJDOC)

Silicon and silicon oxides

s i l i c o n   (properties)
state material data range (μm) Temperature (K) reference (and link)
. silicon n,k [tab] 0.6 - 2.3 (UV-IR) - Ingersoll (1910) Astrophys. J. 32, 265.
cryst. silicon n 1 - 2.6 (IR) - Briggs (1950) Phys. Rev. 77, 287
. silicon . IR Simon (1951) JOSA 41, 730
cryst. silicon abs.c. [fig] 14.3 - 50 (IR) 5 - 500 Collins, Fan (1954) Phys. Rev. 93, 674
cryst. silicon abs. [fig] . 77
300 		Dash, Newman (1955) Phys. Rev. 99, 1151
cryst. silicon n 1.4 - 11 (IR) Salzberg, Villa (1957) J. Opt. Soc. Am. 47, 244
. silicon abs.[fig] 1 - 12 (IR) 5- 300 Spitzer, Fan (1957) Phys. Rev. 108, 268
. silicon abs. [fig] 1.14 - 1.3 (IR) 4.2 - 415 Macfarlane et al. (1958) Phys. Rev. 111, 1245
cryst. silicon n [fig] IR 100 - 297 Cardona et al. (1959) J. Phys. Chem. Sol. 8, 204
cryst. silicon abs.c. [fig] 6.7 - 25 (IR) 20 - 365 Johnson (1959) Proc. Phys. Soc. Lond. 73, 265
. silicon abs. [fig] 0.98 - 1.3 (IR) 20 - 415 Macfarlane et al. (1959) J. Phys. Chem. Solids 8, 388
cryst. silicon n,k [fig]
abs.coeff. [fig] 		0.11 - 1.2 (UV-IR) - Philipp, Taft (1960) Phys. Rev. 120, 37
cryst. silicon n,k [fig] 70 - 600 (IR) - Sasaki, Ishiguro (1962) Phys. Rev. 127, 1091
. silicon e1,2 [fig] IR - Philipp, Ehrenreich (1963) Phys. Rev. 129, 1550
. silicon abs. 2 - 10 (IR) Hara, Nishi (1966) J. Phys. Soc. Jpn. 21, 1222
. silicon abs. coeff. [fig] IR 2 - 415 (IR) Runyan (1966) Technology Semiconductor Silicon, McGraw-Hill
cryst. silicon n,k 70 - 600(IR) Randall, Rawcliffe (1967) Appl. Opt. 6, 1889
. silicon abs. 0.826 - 1.2 (IR) Vol'fson, Subashiev (1967) Sov. Phys. Semicond. 1, 327
amor. silicon k [fig] 0.77 - 2.48 (VIS-IR) 300 - 1222 Brodsky et al. (1970) Phys. Rev. B1, 2632.
cryst. silicon n 1.12 - 2.16 (IR) Primak (1971) Appl. Opt. 10, 759
cryst. silicon abs. coeff.[fig] 0.0118 - 0.0125 (UV) 300 Brown, Rustgi (1972) Phys. Rev. Let. 28, 497.
amor. silicon abs., refl.[fig]
n,k,e1,2 [fig] 		0.0118 - 0.0125 (UV) 300 Brown, Rustgi (1972) Phys. Rev. Let. 28, 497.
amor. silicon n,k; e1,2 [fig] 0.06 - inf-ty (UV-IR) Pierce, Spicer (1972) Phys. Rev. B 5, 3017.
cryst. silicon n,k 0.05 - 0.25 (UV) Philipp (1972) J. Appl. Phys. 43, 2836
. silicon . 0.3655(?) (VIS) So, Vedam (1972) JOSA 62, 16
. silicon . 0.5461 (VIS) So, Vedam (1972) JOSA 62, 596
cryst. silicon n 1.3 - 10 (IR) Villa (1972) Appl. Opt. 11, 2102
cryst. silicon n,k (T) [tab] 30 - 333 (IR) Loewenstein et al. (1973) Appl. Opt. 12, 398.
amor. silicon abs. [fig] 14.3 - 286 (IR) 300 Brodsky, Lurio (1974) Phys. Rev. B 9, 1646.
alpha silicon abs. [fig] 14.3 - 286 (IR) 300 Brodsky, Lurio (1974) Phys. Rev. B 9, 1646.
cryst. silicon k, e2 [fig] 0.4 - 1.2 (VIS-IR) 295 Hulthen (1975) Phys. Scr. 12, 342
. silicon refl. [fig] 0.177 - 12 (UV-IR) 300 Chelikowsky, Cohen (1976) Phys. Rev. B14, 556
cryst. silicon n (T) [tab] 2.5 - 10 (IR) Icenogle et al. (1976) Appl. Opt. 15, 2348.
cryst. silicon n,k [fig] 1 - 100 (IR) - Barta (1977) Infr. Phys. 17, 319
cryst. silicon abs. [fig] 4.5 - 10 (IR) up to 500 Bendow et al. (1977) Appl. Opt. 16, 2909.
cryst. silicon abs.c. [fig] about 0.01 (UV) 300 Brown et al. (1977) Phys. Rev. B15, 478
cryst. silicon abs.c. IR Hordvik, Skolnik (1977) Appl. Opt. 16, 2919
. silicon n,k [t+f] 0.45 - 1 (VIS-IR) Zanzucchi et al. (1977) J. Appl. Phys. 48, 5227
. silicon abs. IR Schroder et al. (1978) IEEE Trans. Electron. Dev. ED-25, 254
. silicon n,k 0.546 (VIS) Taft (1978) J. Electrochem. Soc. 125, 968
hydr. silicon n [fig] 2.48 - 40 (IR) 295 - 473.25 Freeman, Paul (1979) Phys. Rev. B 20, 716.
cryst. silicon abs., refl. [fig] VIS-IR 299 -516 Weakliem, Redfield (1979) J. Appl. Phys. 50, 1491
cryst. silicon n,k 0.2 - 0.83 (UVIS) Aspnes, Theeten (1980) J. Electrochem. Soc. 127, 1359
cryst. silicon n 2.44 - 25 (IR) Edwards, Ochoa (1980) Appl. Opt. 19, 4130
amor. silicon abs. [fig] 0.7 - 1.1 (VIS-IR) 166 - 333 Moddel et al. (1980) Phys. Rev. B22, 1918.
amor. silicon n,k 0.1 - 2.5 (UV-IR) Weiser et al. (1980) J. Non-Cryst. Sol. 35/36, 447
. silicon abs. (T) 0.12 - 1.2 (UV-IR) Sze (1981) Physics of Semiconductor Devices, J.Willey & Sons, NY
. a-Si:H refl.,e2 0.12 - 1.2 (UV-IR) Jan et al. (1982) Sol. Energy Mat. 8, 241
. silicon abs. [fig] 0.3 - 0.83 (UVIS) 295 - 973 Jellison, Modine (1982) Appl. Phys. Lett. 41, 180
. silicon k (T) 1.152 (IR) Jellison, Lowndes (1982) Phys. Rev. 99, 1151
amor. silicon n,k; e1,2 [tab] 0.21 - 0.83 (UVIS) - Aspens, Studna (1983) Phys. Rev. B 27, 985
amor. silicon abs. 0.5 - 1.4 (VIS-IR) - Evangelisti et al. (1983) J. Non-Cryst. Sol. 55, 191
cryst. silicon e1,2 107 GHz Kinasewitz, Senitzki (1983) J. Appl. Phys. 54, 3394
amor. silicon d.f.spectra [fig] 0.21 - 0.83 (UVIS) 300 Aspnes (1983) Phys. Rev. B 29, 768
cryst. silicon n,k (T) [t+f] (c!) 0.0006 - 333 (UV-IR) Edwards in Palik E. (ed) Handbook of Optical Constants of Solids. Acad. Press., p.547. (1985)
amor. silicon n,k [tab] (c!) 0.01 - 148 (UV-IR) Piller (1985) in Palik E. (ed) Handbook of Optical Constants of Solids. Acad. Press., p.571.
. silicon refr.ind.(T) . Dugas et al. (1986) Appl. Opt. 25, 3807
. silicon e 0.22 - 0.73 (UVIS) 30 - 793 Lautenschlager et al. (1987) Phys. Rev. B 36, 4821
. silicon e1,2 0.02 - inf-ty (UV-IR) Adachi (1988) Phys. Rev. B 38, 12966
. silicon abs. . Geist et al. (1988) Appl. Opt. 27, 3777
. silicon opt.const. 0.0024 - 0.1216 (UV) Windt et al. (1988) Appl. Opt. 27, 279
. silicon e1,2 0.02 - inf-ty (UV-IR) Adachi (1989) J. Appl. Phys. 66, 3224
. silicon k 0.633 (VIS) Geist et al. (1990) J. Res. Natl. Inst. Stand. Technol. 95, 549
amor. a-Si:(H) diel. func. nearUV - nearIR Ilsin An et al. (1991) Appl. Phys. Lett. 59, 2543
amor. silicon e1,2 0.28 - 0.69 (UVIS) Fried et al. (1992) J. Appl. Phys. 71, 5260
cryst. silicon n,k [t+f] 0.24 - 0.84 (VIS) 300 Jellison (1992) Opt. Mater. 1, 41
. silicon n,k 0.24 - 0.84 (VIS) 300 - 790 Jellison et al. (1994) J. Appl. Phys. 76, 3758
. silicon energy depos. [fig] 10-6 - 0.12 (UV) - Dwek, Smith (1996) Astrophys. J. 459, 686.
. silicon abs. 0.4 - 0.92 (VIS-IR) Gentile et al. (1994) Appl. Opt. 35, 4392
. silicon . 0.006 - 0.024 (UV) Soufli, Gullikson (1997) Appl. Opt. 36, 5499
porous silicon . . Smyntyna, Vashpanov (1998) SPIE 3359, 553
. silicon n,k [f+t] (c!) 0.207 - 0.414 (UV) Edwards (1998) in Palik E. (ed) Handbook of Optical Constants of Solids, III. Acad. Press, p.531
. silicon n,k [f+t] (c!) 0.4 - 1.13 (VIS-IR) Geist (1998) in Palik E. (ed) Handbook of Optical Constants of Solids, III. Acad. Press, p.519
irrad. silicon opt.depth [fig] 4.6 band (IR) 10 - 250 Strazzulla et al. (1998) Astron. Astrophys. 338, 292.
amor. silicon abs.coef. [fig] 0.15 - inf-ty (UV-IR) Knief, Niessen (1999) Phys. Rev. B 59, 12940
porous silicon refr.ind. . - Lettieri et al. (1999) Opt. Commun. 168, 383
amor. silicon e1,2 [fig] 0.24 - 0.8 (UVIS) Adachi, Mori (2000) Phys. Rev. B 62, 10158
porous silicon e1,2 [fig] 0.06 - inf-ty (UV-IR) De Filippo et al. (2001) Appl. Phys. A 73, 737
. silicon n,k 0.137 - 1.67 (UV-IR) Zollner et al. (2002) Am. Phys. Soc. Meet., U12.009
s i l i c o n   o x i d e   (properties)
fused SiO n,k [fig] 0.2 - 14 (UV-IR) Hass, Salzberg (1954) J. Opt. Soc. Am. 44, 181.
. SiO abs. . Cremer et al. (1958) Z. Electrochem. 62, 939
. SiO . . Ritter (1962) Opt. Acta 9, 197
. SiO n,k [fig] 0.05 - 1 (UV-IR) - Philipp (1971) J. Phys. Chem. Sol. 32, 1935
. SiO1-2 abs. [fig] 7 -25 (IR) - Nakamura et al. (1984) Sol. St. Comm. 50, 1079
non-cryst. SiO n,k [t+f] (c!) 0.05 - 14 (UV-IR) Philipp (1985) in Palik E. (ed) Handbook of Optical Constants of Solids. Acad. Press., p.765.
amor. SiO transm. [fig] 2.5 - 25 (IR) Morioka et al. (1998) Mon. Not. Roy. Astron. Soc. 299, 78.
amor. alpha-SiOx:H abs.c. [fig] 0.5 - 2.5 (UV-IR) Janssen et al. (1999) Phys. Rev. B 60, 13561
s i l i c o n   d i o x i d e   (properties)
. quartz no,e (T) 0.2 - 0.64 (UVIS) Micheli (1902) Ann. Physik 7, 772
cryst. quartz no,e 0.2 - 2.5 (UV-IR) Sosman (1927) Propert. Silica. NY. p.591
. quartz . . Laurens (1928) JOSA 17, 25
cryst. quartz abs. VIS - IR Drummond (1935) Proc. Phys. Soc. Lond. 153, 328
. quartz no,e (T) VIS Barbaron (1948) Compt. Rend. 226, 1443
. quartz no (T) VIS Radhakrishnan (1948) Proc. Ind. Acad. Sci. A27, 44
. quartz no,e (T) 0.25 - 0.6 (UVIS) Radhakrishnan (1951) Proc. Ind. Acad. Sci. A33, 22
. quartz n,k
Abs [fig] 		7.14 - 14.3 (IR) 4 - 880 Simon, McMakon (1953) J. Chem. Phys. 21, 23
fused SiO2 n,k [fig] 0.2 - 14 (UV-IR) Hass, Salzberg (1954) J. Opt. Soc. Am. 44, 181.
amor. SiO2 n [t+f] 0.34 - 3.5 (UV-IR) 288 - 308 Rodney, Spindler (1954) J. Res. NBS 53, 185
fused quartz glass n 0.35 - 3.5 (UV - IR) Rodney, Spindler (1954) J. Opt. Soc. Am. 44, 677
alpha quartz n,ko,e [fig] 7 - 27 (IR) 297 Spitzer, Kleinman (1961) Phys. Rev. 121, 1324.
. quartz n 40 - 300 (FIR) Roberts, Coon (1962) J. Opt. Soc. Am. 52, 1023
fused quartz n,k 0.2 - 3.7 (UV-IR) 293.15 Malitson (1965) J. Opt. Soc. Am. 55, 1205
alpha quartz n,k 0.19 - 0.49 (UVIS) Voronkova et al. (1965) Optich. mater. dlja IK techn. Nauka, Moscow
fused quartz n,k [f+t] 50 - 500 (IR) 300 - 750 Bogens, Zukov (1966) J. Appl. Spektr. 4, 68
cryst. quartz n,ko 0.05 - 0.13(UV) Philipp (1966) Sol. St. Comm. 4, 73
fused quartz n,k 0.05 - 0.1 (UV) - Philipp (1966) Sol. St. Comm. 4, 73
fused silica n [appr] 0.224 - 3.09 (UV-IR) Buerger, Katzin (1967) J. Inorg. Nucl. Chem. 29, 2715
. quartz n [appr] 0.224 - 3.09 (UV-IR) Buerger, Katzin (1967) J. Inorg. Nucl. Chem. 29, 2715
. SiO2 abs. soft X-ray Ershov, Lukirskii (1967) Sov. Phys. Sol. St. 8, 1699
. quartz refl. . Perry, Wrigley (1967) Appl. Opt. 6, 586
. SiO2 Raman sp. . Porto, Krishnan (1967) J. Chem. Phys. 47, 1009
fused quartz n, abs. [fig] 110 - 550 (UVIS) Randall, Rawcliffe (1967) Appl. Opt. 6, 1889.
fused silica Q 100 - 1000 (FIR) - Bagdad, Stolen (1968) J. Phys. Chem. Sol. 29, 2001
cryst. quartz ne-no 0.15 - 0.3 (UV) Chandrasekharan, Damany (1968) Appl. Opt. 7, 939
fused quartz refl. (T) [fig] 0.06 - 0.14 (UV) Platzoeder, Steinmann (1968) J. Opt. Soc. Am. 58, 588.
cryst. quartz ne-no (UV) Chandrasekharan, Damany (1969) Appl. Opt. 8, 671
glas. silica n 0.23 - 3.37 (UV-IR) 300 - 1100 Wray, Neu (1969) J. Opt. Soc. Am. 59, 774
amor. SiO2 bands . Potapov, Rakov (1970) Opt. Spektr. 29, 751
amor. SiO2 n,k [tab] 7.1 - 11.1 (IR) Zolotarev (1970) Opt. Spektr. 29, 66.
fused silica n (T) [tab] 0.23 - 3.37 (UV-IR) Singh (1971) Optik 33, 293.
glas. silica n [tab] 0.404 - 0.867 (VIS) 73 - 293 Waxler, Cleek (1971) J. Res. Nat. Stand. A 75, 279
cryst. quartz n,k 0.1 - 4 (UV-IR) Amer. Inst. Phys. Handbook. (1972) McGraw Hill, NY. p.27
amor. SiO2 photoem. [fig] 0.0008 - 0.021 (UV) - DiStefano et al. (1972) Phys. Rev. Lett. 27, 1560
. quartz em. spectra (a) [fig] 6 - 11.8 (IR) Hunt, Logan (1972) Appl. Opt. 11, 142.
amor. quartz n,k [tab] 7.1 - 50 (IR) Popova et al. (1972) Opt. Spektr. 33, 801.
alpha quartz refl. 2.5 - 50 (IR) Vlasov et al. (1972) IK spektry neorg.stekol. Himija, Leningrad. p.303
alpha quartz n,ko,e (T) [tab] 30 - 333 (IR) 1.5 & 293 Loewenstein et al. (1973) Appl. Opt. 12, 398.
cryst. quartz transm., refl., e2 [fig] 0.033 - 0.155 (UV) Sorokin et al. (1973) Opt. Spektr. 35, 501.
amor. quartz m.abs.c. [t+f] 8.9 (IR) Day et al. (1974) Astrophys. J. 191, 415.
alpha quartz e 1 MHz 300 Fontella et al. (1974) J. Appl. Phys. 45, 2852
amor. quartz n,k 1 - 50 (IR) Steyer (1974) Ph.D. thesis, Uni. Ariz.
amor. quartz n,k [tab] 7.14 - 25 (IR) Steyer et al. (1974) Appl. Opt. 13, 1586.
cryst. quartz n [fig] 40 - 133 (IR) 1.6 Alvarez et al. (1975) Infr. Phys. 15, 45
. quartz abs. IR Galeener, Lucovski (1975) in Balkanski M. et al. (eds) Light Scat. Solids. Flammar., p.641
alpha quartz n,k 5.2 - 50 (IR) - Gaskell, Johnson (1976) J. Non-cryst. Solids 20, 153
. silica refr.ind. 0.5 - 1.1 (VIS-IR) Presby, Kaminov (1978) Appl. Opt. 15, 3029
cryst. quartz n,k [tab] 0.1 - 0.14 (UV) Lamy (1977) Appl. Opt. 16, 2212.
fused quartz n,k [tab] 0.1 - 0.165 (UV) Lamy (1977) Appl. Opt. 16, 2212.
diff SiO2 abs. [fig] 0.3 - 0.5 (UVIS) Harrington et al. (1978) Appl. Opt. 17, 1541.
fused quartz n [fig] 8.3 - 500 (IR) 300 Parker et al. (1978) Infr. Phys. 18, 215+221
fused quartz n,k 1.2 - 41 (IR) Philipp (1978) J. Appl. Phys. 50, 1053
. silica refr.ind. . Presby, Kaminov (1978) Appl. Opt. 17, 3530
amor. SiO2 . soft X-ray Senemand, Costa Limo (1978) in Pantelides T. (ed) Phys. SiO2 & its Interfac. Perg., p.75
cryst. SiO2 . soft X-ray Senemand, Costa Limo (1978) in Pantelides T. (ed) Phys. SiO2 & its Interfac. Perg., p.75
amor. SiO2 k [fig] 0.09 - 0.18 (UV) Weinberg et al. (1979) Phys. Rev. B19, 3107
. quartz . (o-ray) FIR Cummings, Tanner (1980) J. Opt. Soc. Am. 70, 123
glas. SiO2 n,k [tab] 0.007 - 0.31 (UV) Rife, Osantowski (1980) J. Opt. Soc. Am. 70, 1513.
. quartz n,k (calc) X-rays Henke (1981) in Attwood D.T., Henke B.L. (eds) Low Energy X-ray Diagn. AIP Conf. Proc., 75
alpha,beta quartz bands . Gorelik et al. (1982) Prepr. FIAN, 58
fused quartz e1,2 [fig] 7 - 25 (IR) Thiebaud, Kneuluehl (1983) Infr. Phys. 23, 131
fused silica . 3 - 25 (IR) Lang, Wolfe (1983) Appl. Opt. 22, 1267
fused silica . 0.3 - 25 (UV-IR) Su (1983) Appl. Opt. 22, 2949
. SiO1-2 abs. 0.88 - 3 (IR) Nakamura et al. (1984) Sol. St. Comm. 50, 1079
fused silica refr.ind. 0.355 (VIS) White, Smith (1984) Opt. Lett. 9, 10
alpha SiO2 n,k [tab] 0.05 - 1000 (UV-mm) Philipp (1985) in Palik E. (ed) Handbook of Optical Constants of Solids. Acad. Press., p.719.
glas. SiO2 n,k [tab] 0.0006 - 500 (UV-IR) Philipp (1985) in Palik E. (ed) Handbook of Optical Constants of Solids. Acad. Press., p.749.
fused silica Qext/a (a) [fig] 7 - 200(IR) - Koike et al. (1987) Astrophys. Sp. Sci. 134, 95.
fused silica refr.ind.(T) 0.1849 (UV) Lira, Vest (1987) Appl. Opt. 26, 774
fused quartz n,k [tab] 50 - 1000 (IR-mm) Zhilinskii et al. (1987) Opt. Spektr. 62, 1327.
fused quartz n,k [fig] 7 - 300 (IR) - Koike et al. (1989) Mon. Not. Roy. Astron. Soc. 239, 127.
glas. silica n (T) . 301 - 398 Jewell (1991) J. Am. Ceram. Soc. 74, 1689
fused quartz ext. [fig] 7 - 400 (IR) - Koike, Shibai (1991) in Levasseur-Regourd, Hasegawa (eds) Origin and Evolution of Interplanetary Dust. Kluwer. p.121.
glas. natural SiO2 ext. [fig] 7 - 400 (IR) - Koike, Shibai (1991) in Levasseur-Regourd, Hasegawa (eds) Origin and Evolution of Interplanetary Dust. Kluwer. p.121.
fused quartz Q [fig] 2 - 400 (IR) - Koike, Shibai (1991) Mon.Not.Roy.Astron.Soc. 269, 1011.
glas. silica n [f+t] 0.24 - 0.55 (UVIS) 109 - 356 Matsuoka et al. (1991) J. Non-Cryst. Sol. 135, 86
glas. SiO2 n,k [tab] 0.0001 - 0.024 (UV) Palik (1991) in Palik E. (ed) Handbook of Optical Constants of Solids. II. Acad.Press., p.12.
cryst. SiO2 e2,cond. [fig] 0.06 - inf-ty (UV-IR) - Xu, Ching (1991) Phys. Rev. B 44, 11048
sput. SiO2 n,k [tab] 0.2 - 1.2 (UV-IR) Edlou et al. (1993) Appl. Opt. 32, 5601.
fused silica n (T) 0.2 - 1.7 (UV-NIR) Ghosh (1994) IEEE Phot. Techn. Lett. 6, 431
glass. silica refr.ind. . Kato et al. (1995) Opt. Lett. 20, 2279
. quartz . . Shoji et al. (1995) JOSA 14, 2268
cryst. quartz n,k, emiss. [fig] 7 - 13 (IR) Wald, Salisbury (1995) J. Geophys. Res. 100, 24665.
amor. SiO2 . 0.0014 - 0.025 (UV) Filatova et al. (1996) Opt. Spectr. 81, 416
cryst. quartz n,k [fig]; par. [tab] 7.7 - 500 (IR) Wenrich, Christensen (1996) J. Geophys. Res. 101, 15921.
amor. quartz n,k (T) [tab?] 6.7 - 500 (IR) Henning, Mutschke (1997) Astron. Astrophys. 327, 743
cryst. quartz n,k [fig] 5 - 24 (IR) - Mustard, Hays (1997) Icarus 125, 145.
. SiO2 refr.ind. 0.38 - 0.8 (VIS) Poenar, Wolffenbuttel (1997) Appl. Opt. 36, 5122
. silica . . Ghosh, Yajima (1998) J. Lightware Techn. 16, 2002
fused silica refr.ind. (T) 0.19 - 0.196 (UV) 288 - 298 Gupta et al. (1998) Appl. Opt. 37, 5964
fused silica refr.ind. (c) 0.351,0.527,1.053 (VIS-IR) Milam (1998) Appl. Opt. 37, 546
glas. SiO2 n 3 - 6.7 (IR) Tan (1998) J. Non-Cryst. Sol. 223, 158
cryst. quartz n [f+t] 0.2 - 2.2 (UV-IR) - Ghosh (1999) Opt. Comm. 163, 95
glas. SiO2 n [fig] 1-5 (IR) Tan (1999) Physica B 262, 98; J. Non-Cryst. Sol. 249, 51
. SiO2 n,k [fig]
Real. [fig] 		0.38 - 0.85 323 - 593 (VIS) Vergohl et al. (1999) Thin Sol. Films 351, 42
alpha quartz abs. [fig] 0.06 - 0.25 (UV) - Chang et al. (2000) Phys. Rev. Lett. 85, 2613
amor. silica sp. [fig] 7 - 100 (IR) 1220 K Fabian et al. (2000) Astron. Astrophys. 364, 282.
amor. SiO2 n,k 0.77 - 1.1 (UV-IR) - Gunde (2000) Physica B 292, 286
fused silica . . Murphy, Flavin (2000) Appl. Opt. 39, 4607
amor. SiO2 refr.ind. IR - Ortiz et al. (2000) Thin Sol. Films 368, 74
ion-irrad. SiO2 refr.ind. [fig] . - Swart et al. (2000) Nucl. Instr. Meth. Phys. Res. 166-7, 171
glas. SiO2 n [fig] 1.44 - 4.77 (IR) 296 - 754 Tan, Arndt (2000) J. Phys. Chem. Solid. 61, 1315.
fused silica . . Ekvall et al. (2001) Opt. Lett. 26, 896
fused silica refr. ind. 0.5-0.9 (VIS) Hlubina (2001) Opt. Comm. 193, 1.
glas. silica n [tab] 1.31 - 4.84 (IR) 296 Tan, Arndt (2001) J. Phys. Chem. Solid. 62, 1087.
fused silica refr.ind. . Obata et al. (2002) Opt. Lett. 27, 330
. SiO2 n,k very wide Zollner et al. (2002) Am. Phys. Soc. Meet., U12.009
amorphous SiO2 (Lancaster) abs. coeff. [fig]
transm. [fig]		 100μm - 2mm (5-100cm-1) 10 - 300 Boudet et al. (Jul-05) ApJ
amorphous SiO2 Qext [fig.] 8-10 (IR) Tamanai et al. (2006) J. Quant. Spectrosc. Radiat. Transfer
- α-Quartz Refl. [fig.] 10-50 (MIR) 300-900K S. Zeidler et al.(2013) Astronomy & Astrophysics, Volume 553, id.A81, 15 pp.
- quartz Refl.[fig.] 3-6 (IR) - Thompson, M.S. et al. (2020) Icarus, Volume 346, article id. 113775
Notes:
state: amor. - amorphous, cryst. - crystalline, glas. - glassy, hydr. - hydrous/hydrated.
data: abs - absorption, abs.c. - absorption coefficient, disp.par. - dispersion parameters, e1,2 - dielectric function, ext. - extinction, m.abs.c. - mass absorption coefficient, n,k - refractive index, o,e - ordinary/extraordinary ray, photoem. - photoemission, refl. - reflectance, transm. - transmittance; (T) - dependence on temperature; [fig] - figure, [tab] - table, [t+f] - table and figure, (c!) - compilation.

1 The quick-look figures were borrowed from the graphic library of the Ioffe Physical Institute.

04.06.2024