Silicon and silicon oxides
silicon (quick look1 at amorphous, crystalline, porous silicon data)
silicon oxide (quick look1 at SiO data)
silicon dioxide (quick look1 at SiO2 data)
s i l i c o n (properties) | |||||
state | material | data | range (micron) | Temperature | reference (and link) |
---|---|---|---|---|---|
. | silicon | n,k [tab] | 0.6 - 2.3 | Ingersoll (1910) Astrophys. J. 32, 265. | |
cryst. | silicon | n | 1 - 2.6 | Briggs (1950) Phys. Rev. 77, 287 | |
. | silicon | . | infrared | Simon (1951) JOSA 41, 730 | |
cryst. | silicon | abs.c.(T) [fig] | 14.3 - 50 | Collins, Fan (1954) Phys. Rev. 93, 674 | |
cryst. | silicon | abs. (T) | . | Dash, Newman (1955) Phys. Rev. 99, 1151 | |
cryst. | silicon | n | 1.4 - 11 | Salzberg, Villa (1957) J. Opt. Soc. Am. 47, 244 | |
. | silicon | abs. | 1 - 12 | Spitzer, Fan (1957) Phys. Rev. 108, 268 | |
. | silicon | abs. | . | Macfarlane et al. (1958) Phys. Rev. 111, 1245 | |
cryst. | silicon | n | infrared | Cardona et al. (1959) J. Phys. Chem. Sol. 8, 204 | |
cryst. | silicon | abs.c. | 6.7 - 25 | Johnson (1959) Proc. Phys. Soc. Lond. 73, 265 | |
. | silicon | abs. (T) | 0.95 - 1.27 eV | Macfarlane et al. (1959) J. Phys. Chem. Solids 8, 388 | |
cryst. | silicon | n,k [fig] | 0.11 - 1.2 | Philipp, Taft (1960) Phys. Rev. 120, 37 | |
cryst. | silicon | n,k | 70 - 600 | Sasaki, Ishiguro (1962) Phys. Rev. 127, 1091 | |
. | silicon | e | infrared | Philipp, Ehrenreich (1963) Phys. Rev. 129, 1550 | |
. | silicon | abs. | 2 - 10 | Hara, Nishi (1966) J. Phys. Soc. Jpn. 21, 1222 | |
. | silicon | abs. (T) | infrared | Runyan (1966) Technology Semiconductor Silicon, McGraw-Hill | |
cryst. | silicon | n,k | 70 - 600 | Randall, Rawcliffe (1967) Appl. Opt. 6, 1889 | |
. | silicon | abs. | 1 - 1.5 eV | Vol'fson, Subashiev (1967) Sov. Phys. Semicond. 1, 327 | |
amor. | silicon | k (T) [fig] | 0.77 - 2.48 | Brodsky et al. (1970) Phys. Rev. B1, 2632. | |
cryst. | silicon | n | 1.12 - 2.16 | Primak (1971) Appl. Opt. 10, 759 | |
cryst. | silicon | abs. [fig] | 0.0118 - 0.0125 | Brown, Rustgi (1972) Phys. Rev. Let. 28, 497. | |
amor. | silicon | abs. [fig] | 0.0118 - 0.0125 | Brown, Rustgi (1972) Phys. Rev. Let. 28, 497. | |
amor. | silicon | n,k; e1,2 [fig] | 0.06 - inf-ty | Pierce, Spicer (1972) Phys. Rev. B 5, 3017. | |
cryst. | silicon | n,k | 0.05 - 0.25 | Philipp (1972) J. Appl. Phys. 43, 2836 | |
. | silicon | . | 0.3655(?) | So, Vedam (1972) JOSA 62, 16 | |
. | silicon | . | 0.5461 | So, Vedam (1972) JOSA 62, 596 | |
cryst. | silicon | n | 1.3 - 10 | Villa (1972) Appl. Opt. 11, 2102 | |
cryst. | silicon | n,k (T) [tab] | 30 - 333 | Loewenstein et al. (1973) Appl. Opt. 12, 398. | |
amor. | silicon | abs. [fig] | 14.3 - 286 | Brodsky, Lurio (1974) Phys. Rev. B 9, 1646. | |
alpha | silicon | abs. [fig] | 14.3 - 286 | Brodsky, Lurio (1974) Phys. Rev. B 9, 1646. | |
cryst. | silicon | k; e2 | . | Hulthen (1975) Phys. Scr. 12, 342 | |
. | silicon | refl. | 0.1 - 7 eV | Chelikowsky, Cohen (1976) Phys. Rev. B14, 556 | |
cryst. | silicon | n (T) [tab] | 2.5 - 10 | Icenogle et al. (1976) Appl. Opt. 15, 2348. | |
cryst. | silicon | n,k [fig] | 1 - 100 | Barta (1977) Infr. Phys. 17, 319 | |
cryst. | silicon | abs. (T) [fig] | 4.5 - 10 | Bendow et al. (1977) Appl. Opt. 16, 2909. | |
cryst. | silicon | abs.c. | about 0.01 | Brown et al. (1977) Phys. Rev. B15, 478 | |
cryst. | silicon | abs.c. | infrared | Hordvik, Skolnik (1977) Appl. Opt. 16, 2919 | |
. | silicon | n,k [t+f] | 0.45 - 1 | Zanzucchi et al. (1977) J. Appl. Phys. 48, 5227 | |
. | silicon | abs. | infrared | Schroder et al. (1978) IEEE Trans. Electron. Dev. ED-25, 254 | |
. | silicon | n,k | 0.546 | Taft (1978) J. Electrochem. Soc. 125, 968 | |
hydr. | silicon | n (T) [fig] | 2.48 - 40 | Freeman, Paul (1979) Phys. Rev. B 20, 716. | |
cryst. | silicon | abs. (T) | vis. - IR | Weakliem, Redfield (1979) J. Appl. Phys. 50, 1491 | |
cryst. | silicon | n,k | 0.2 - 0.83 | Aspnes, Theeten (1980) J. Electrochem. Soc. 127, 1359 | |
cryst. | silicon | n | 2.44 - 25 | Edwards, Ochoa (1980) Appl. Opt. 19, 4130 | |
amor. | silicon | abs. [fig] | 0.7 - 1.1 | Moddel et al. (1980) Phys. Rev. B22, 1918. | |
amor. | silicon | n,k | 0.1 - 2.5 | Weiser et al. (1980) J. Non-Cryst. Sol. 35/36, 447 | |
. | silicon | abs. (T) | 0.12 - 1.2 | Sze (1981) Physics of Semiconductor Devices, J.Willey & Sons, NY | |
. | a-Si:H | refl.,e2 | 0.12 - 1.2 | Jan et al. (1982) Sol. Energy Mat. 8, 241 | |
. | silicon | abs. (T) | 0.3 - 0.83 | Jellison, Modine (1982) Appl. Phys. Lett. 41, 180 | |
. | silicon | k (T) | 1.152 | Jellison, Lowndes (1982) Phys. Rev. 99, 1151 | |
amor. | silicon | n,k; e1,2 [tab] | 0.21 - 0.83 | Aspens, Studna (1983) Phys. Rev. B 27, 985 | |
amor. | silicon | abs. | 0.5 - 1.4 | Evangelisti et al. (1983) J. Non-Cryst. Sol. 55, 191 | |
cryst. | silicon | e1,2 | 107 GHz | Kinasewitz, Senitzki (1983) J. Appl. Phys. 54, 3394 | |
amor. | silicon | d.f.spectra [fig] | 0.21 - 0.83 | Aspnes (1983) Phys. Rev. B 29, 768 | |
cryst. | silicon | n,k (T) [t+f] (c!) | 0.0006 - 333 | Edwards (1985) in Palik E. (ed) Handbook of Optical Constants of Solids. Acad. Press., p.547. | |
amor. | silicon | n,k [tab] (c!) | 0.01 - 148 | Piller (1985) in Palik E. (ed) Handbook of Optical Constants of Solids. Acad. Press., p.571. | |
. | silicon | refr.ind.(T) | . | Dugas et al. (1986) Appl. Opt. 25, 3807 | |
. | silicon | e | 0.22 - 0.73 | Lautenschlager et al. (1987) Phys. Rev. B 36, 4821 | |
. | silicon | e1,2 | 0.02 - inf-ty | Adachi (1988) Phys. Rev. B 38, 12966 | |
. | silicon | abs. | . | Geist et al. (1988) Appl. Opt. 27, 3777 | |
. | silicon | opt.const. | 0.0024 - 0.1216 | Windt et al. (1988) Appl. Opt. 27, 279 | |
. | silicon | e1,2 | 0.02 - inf-ty | Adachi (1989) J. Appl. Phys. 66, 3224 | |
. | silicon | k | 0.633 | Geist et al. (1990) J. Res. Natl. Inst. Stand. Technol. 95, 549 | |
amor. | a-Si:(H) | diel. func. | nearUV - nearIR | Ilsin An et al. (1991) Appl. Phys. Lett. 59, 2543 | |
amor. | silicon | e1,2 | 0.28 - 0.69 | Fried et al. (1992) J. Appl. Phys. 71, 5260 | |
cryst. | silicon | n,k | vis. | Jellison (1992) Opt. Mater. 1, 41 | |
. | silicon | n,k (T) | vis. | Jellison et al. (1994) J. Appl. Phys. 76, 3758 | |
. | silicon | energy depos. [fig] | 10-6 - 0.12 | Dwek, Smith (1996) Astrophys. J. 459, 686. | |
. | silicon | abs. | . | Gentile et al. (1994) Appl. Opt. 35, 4392 | |
. | silicon | . | 50-180 eV | Soufli, Gullikson (1997) Appl. Opt. 36, 5499 | |
porous | silicon | . | . | Smyntyna, Vashpanov (1998) SPIE 3359, 553 | |
. | silicon | n,k [f+t] (c!) | 0.207 - 0.414 | Edwards (1998) in Palik E. (ed) Handbook of Optical Constants of Solids, III. Acad. Press, p.531 | |
. | silicon | n,k [f+t] (c!) | 0.4 - 1.13 | Geist (1998) in Palik E. (ed) Handbook of Optical Constants of Solids, III. Acad. Press, p.519 | |
irrad. | silicon | opt.depth [fig] | 4.6 band | Strazzulla et al. (1998) Astron. Astrophys. 338, 292. | |
amor. | silicon | abs.coef. [fig] | 0.15 - inf-ty | Knief, Niessen (1999) Phys. Rev. B 59, 12940 | |
porous | silicon | refr.ind. | . | Lettieri et al. (1999) Opt. Commun. 168, 383 | |
amor. | silicon | e1,2 [fig] | 0.24 - 0.8 | Adachi, Mori (2000) Phys. Rev. B 62, 10158 | |
porous | silicon | e1,2 [fig] | 0.06 - inf-ty | De Filippo et al. (2001) Appl. Phys. A 73, 737 | |
. | silicon | n,k | very wide | Zollner et al. (2002) Am. Phys. Soc. Meet., U12.009 | |
s i l i c o n   o x i d e (properties) | |||||
fused | SiO | n,k [fig] | 0.2 - 14 | Hass, Salzberg (1954) J. Opt. Soc. Am. 44, 181. | |
. | SiO | abs. | . | Cremer et al. (1958) Z. Electrochem. 62, 939 | |
. | SiO | . | . | Ritter (1962) Opt. Acta 9, 197 | |
. | SiO | n,k | 0.05 - 1 | Philipp (1971) J. Phys. Chem. Sol. 32, 1935 | |
. | SiO1-2 | abs. | infrared | Nakamura et al. (1984) Sol. St. Comm. 50, 1079 | |
non-cryst. | SiO | n,k [t+f] (c!) | 0.05 - 14 | Philipp (1985) in Palik E. (ed) Handbook of Optical Constants of Solids. Acad. Press., p.765. | |
amor. | SiO | transm. [fig] | 2.5 - 25 | Morioka et al. (1998) Mon. Not. Roy. Astron. Soc. 299, 78. | |
amor. | alpha-SiOx:H | abs.c. [fig] | 0.5 - 2.5 | Janssen et al. (1999) Phys. Rev. B 60, 13561 | |
s i l i c o n   d i o x i d e (properties) | |||||
. | quartz | no,e (T) | 0.2 - 0.64 | Micheli (1902) Ann. Physik 7, 772 | |
cryst. | quartz | no,e | 0.2 - 2.5 | Sosman (1927) Propert. Silica. NY. p.591 | |
. | quartz | . | . | Laurens (1928) JOSA 17, 25 | |
cryst. | quartz | abs. | visual - IR | Drummond (1935) Proc. Phys. Soc. Lond. 153, 328 | |
. | quartz | no,e (T) | visual | Barbaron (1948) Compt. Rend. 226, 1443 | |
. | quartz | no (T) | visual | Radhakrishnan (1948) Proc. Ind. Acad. Sci. A27, 44 | |
. | quartz | no,e (T) | 0.25 - 0.6 | Radhakrishnan (1951) Proc. Ind. Acad. Sci. A33, 22 | |
. | quartz | . | . | Simon, McMakon (1953) J. Chem. Phys. 21, 23 | |
fused | SiO2 | n,k [fig] | 0.2 - 14 | Hass, Salzberg (1954) J. Opt. Soc. Am. 44, 181. | |
amor. | SiO2 | n (T) | 0.34 - 3.5 | Rodney, Spindler (1954) J. Res. NBS 53, 185 | |
fused | quartz glass | refr.ind. | UV - IR | Rodney, Spindler (1954) J. Opt. Soc. Am. 44, 677 | |
alpha | quartz | n,ko,e [fig] | 7 - 27 | Spitzer, Kleinman (1961) Phys. Rev. 121, 1324. | |
. | quartz | . | far-IR | Roberts, Coon (1962) J. Opt. Soc. Am. 52, 1023 | |
fused | quartz | n,k | 0.2 - 3.7 | Malitson (1965) J. Opt. Soc. Am. 55, 1205 | |
alpha | quartz | n,k | 0.19 - 0.49 | Voronkova et al. (1965) Optich. mater. dlja IK techn. Nauka, Moscow | |
fused | quartz | n,k | 50 - 500 | Bogens, Zukov (1966) J. Appl. Spektr. 4, 68 | |
cryst. | quartz | n,ko | 0.05 - 0.13 | Philipp (1966) Sol. St. Comm. 4, 73 | |
fused | quartz | n,k | 0.05 - 0.1 | Philipp (1966) Sol. St. Comm. 4, 73 | |
fused | silica | n [appr] | 0.224 - 3.09 | Buerger, Katzin (1967) J. Inorg. Nucl. Chem. 29, 2715 | |
. | quartz | n [appr] | 0.224 - 3.09 | Buerger, Katzin (1967) J. Inorg. Nucl. Chem. 29, 2715 | |
. | SiO2 | abs. | soft X-ray | Ershov, Lukirskii (1967) Sov. Phys. Sol. St. 8, 1699 | |
. | quartz | refl. | . | Perry, Wrigley (1967) Appl. Opt. 6, 586 | |
. | SiO2 | Raman sp. | . | Porto, Krishnan (1967) J. Chem. Phys. 47, 1009 | |
fused | quartz | n, abs. [fig] | 110 - 550 | Randall, Rawcliffe (1967) Appl. Opt. 6, 1889. | |
fused | silica | Q | far-IR | Bagdade, Stolen (1968) J. Phys. Chem. Sol. 29, 2001 | |
cryst. | quartz | ne-no | ultraviolet | Chandrasekharan, Damany (1968) Appl. Opt. 7, 939 | |
fused | quartz | refl. (T) [fig] | 0.06 - 0.14 | Platzoeder, Steinmann (1968) J. Opt. Soc. Am. 58, 588. | |
cryst. | quartz | ne-no | ultraviolet | Chandrasekharan, Damany (1969) Appl. Opt. 8, 671 | |
glas. | silica | n (T) | 0.23 - 3.37 | Wray, Neu (1969) J. Opt. Soc. Am. 59, 774 | |
amor. | SiO2 | bands | . | Potapov, Rakov (1970) Opt. Spektr. 29, 751 | |
amor. | SiO2 | n,k [tab] | 7.1 - 11.1 | Zolotarev (1970) Opt. Spektr. 29, 66. | |
fused | silica | n (T) [tab] | 0.23 - 3.37 | Singh (1971) Optik 33, 293. | |
glas. | silica | n (T) | . | Waxler, Cleek (1971) J. Res. Nat. Stand. A 75, 279 | |
cryst. | quartz | n,k | 0.1 - 4 | Amer. Inst. Phys. Handbook. (1972) McGraw Hill, NY. p.27 | |
amor. | SiO2 | photoem. [fig] | . | DiStefano et al. (1972) Phys. Rev. Lett. 27, 1560 | |
. | quartz | em. spectra (a) [fig] | 6 - 11.8 | Hunt, Logan (1972) Appl. Opt. 11, 142. | |
amor. | quartz | n,k [tab] | 7.1 - 50 | Popova et al. (1972) Opt. Spektr. 33, 801. | |
alpha | quartz | refl. | 2.5 - 50 | Vlasov et al. (1972) IK spektry neorg.stekol. Himija, Leningrad. p.303 | |
alpha | quartz | n,ko,e (T) [tab] | 30 - 333 | Loewenstein et al. (1973) Appl. Opt. 12, 398. | |
cryst. | quartz | transm., refl., e2 [fig] | 0.033 - 0.155 | Sorokin et al. (1973) Opt. Spektr. 35, 501. | |
amor. | quartz | m.abs.c. [t+f] | 8.9 | Day et al. (1974) Astrophys. J. 191, 415. | |
alpha | quartz | e | 1 MHz | Fontella et al. (1974) J. Appl. Phys. 45, 2852 | |
amor. | quartz | n,k | 1 - 50 | Steyer (1974) Ph.D. thesis, Uni. Ariz. | |
amor. | quartz | n,k [tab] | 7.14 - 25 | Steyer et al. (1974) Appl. Opt. 13, 1586. | |
cryst. | quartz | n (T) [fig] | 40 - 133 | Alvarez et al. (1975) Infr. Phys. 15, 45 | |
. | quartz | abs. | infrared | Galeener, Lucovski (1975) in Balkanski M. et al. (eds) Light Scat. Solids. Flammar., p.641 | |
alpha | quartz | n,k | 5.2 - 50 | Gaskell, Johnson (1976) J. Non-cryst. Solids 20, 153 | |
. | silica | refr.ind. | . | Presby, Kaminov (1978) Appl. Opt. 15, 3029 | |
cryst. | quartz | n,k [tab] | 0.1 - 0.14 | Lamy (1977) Appl. Opt. 16, 2212. | |
fused | quartz | n,k [tab] | 0.1 - 0.165 | Lamy (1977) Appl. Opt. 16, 2212. | |
diff | SiO2 | abs. [fig] | 0.3 - 0.5 | Harrington et al. (1978) Appl. Opt. 17, 1541. | |
fused | quartz | n [fig] | 8.3 - 500 | Parker et al. (1978) Infr. Phys. 18, 215+221 | |
fused | quartz | n,k | infrared | Philipp (1978) J. Appl. Phys. 50, 1053 | |
. | silica | refr.ind. | . | Presby, Kaminov (1978) Appl. Opt. 17, 3530 | |
amor. | SiO2 | . | soft X-ray | Senemand, Costa Limo (1978) in Pantelides T. (ed) Phys. SiO2 & its Interfac. Perg., p.75 | |
cryst. | SiO2 | . | soft X-ray | Senemand, Costa Limo (1978) in Pantelides T. (ed) Phys. SiO2 & its Interfac. Perg., p.75 | |
amor. | SiO2 | k [fig] | 0.09 - 0.18 | Weinberg et al. (1979) Phys. Rev. B19, 3107 | |
. | quartz | . (o-ray) | far-IR | Cummings, Tanner (1980) J. Opt. Soc. Am. 70, 123 | |
glas. | SiO2 | n,k [tab] | 0.007 - 0.31 | Rife, Osantowski (1980) J. Opt. Soc. Am. 70, 1513. | |
. | quartz | n,k (calc) | X-rays | Henke (1981) in Attwood D.T., Henke B.L. (eds) Low Energy X-ray Diagn. AIP Conf. Proc., 75 | |
alpha,beta | quartz | bands | . | Gorelik et al. (1982) Prepr. FIAN, 58 | |
fused | quartz | e1,2 [fig] | 7 - 25 | Thiebaud, Kneuluehl (1983) Infr. Phys. 23, 131 | |
fused | silica | . | 3 - 25 | Lang, Wolfe (1983) Appl. Opt. 22, 1267 | |
fused | silica | . | 0.3 - 25 | Su (1983) Appl. Opt. 22, 2949 | |
. | SiO1-2 | abs. | infrared | Nakamura et al. (1984) Sol. St. Comm. 50, 1079 | |
fused | silica | refr.ind. | 0.355 | White, Smith (1984) Opt. Lett. 9, 10 | |
alpha | SiO2 | n,k [tab] | 0.05 - 1000 | Philipp (1985) in Palik E. (ed) Handbook of Optical Constants of Solids. Acad. Press., p.719. | |
glas. | SiO2 | n,k [tab] | 0.0006 - 500 | Philipp (1985) in Palik E. (ed) Handbook of Optical Constants of Solids. Acad. Press., p.749. | |
fused | silica | Qext/a (a) [fig] | 7 - 200 | Koike et al. (1987) Astrophys. Sp. Sci. 134, 95. | |
fused | silica | refr.ind.(T) | 0.1849 | Lira, Vest (1987) Appl. Opt. 26, 774 | |
fused | quartz | n,k [tab] | 50 - 1000 | Zhilinskii et al. (1987) Opt. Spektr. 62, 1327. | |
fused | quartz | n,k [fig] | 7 - 300 | Koike et al. (1989) Mon. Not. Roy. Astron. Soc. 239, 127. | |
glas. | silica | n (T) | . | Jewell (1991) J. Am. Ceram. Soc. 74, 1689 | |
fused | quartz | ext. [fig] | 7 - 400 | Koike, Shibai (1991) in Levasseur-Regourd, Hasegawa (eds) Origin and Evolution of Interplanetary Dust. Kluwer. p.121. | |
glas. | natural SiO2 | ext. [fig] | 7 - 400 | Koike, Shibai (1991) in Levasseur-Regourd, Hasegawa (eds) Origin and Evolution of Interplanetary Dust. Kluwer. p.121. | |
fused | quartz | Q [fig] | 2 - 400 | Koike, Shibai (1991) Mon.Not.Roy.Astron.Soc. 269, 1011. | |
glas. | silica | n (T) | 0.24 - 0.55 | Matsuoka et al. (1991) J. Non-Cryst. Sol. 135, 86 | |
glas. | SiO2 | n,k [tab] | 0.0001 - 0.024 | Palik (1991) in Palik E. (ed) Handbook of Optical Constants of Solids. II. Acad.Press., p.12. | |
cryst. | SiO2 | e2,cond. [fig] | 0.06 - inf-ty | Xu, Ching (1991) Phys. Rev. B 44, 11048 | |
sput. | SiO2 | n,k [tab] | 0.2 - 1.2 | Edlou et al. (1993) Appl. Opt. 32, 5601. | |
fused | silica | n (T) | UV - near-IR | Ghosh (1994) IEEE Phot. Techn. Lett. 6, 431 | |
glass. | silica | refr.ind. | . | Kato et al. (1995) Opt. Lett. 20, 2279 | |
. | quartz | . | . | Shoji et al. (1995) JOSA 14, 2268 | |
cryst. | quartz | n,k, emiss. [fig] | 7 - 13 | Wald, Salisbury (1995) J. Geophys. Res. 100, 24665. | |
amor. | SiO2 | . | 0.0014 - 0.025 | Filatova et al. (1996) Opt. Spectr. 81, 458 | |
cryst. | quartz | n,k [fig]; par. [tab] | 7.7 - 500 | Wenrich, Christensen (1996) J. Geophys. Res. 101, 15921. | |
amor. | quartz | n,k (T) [tab?] | 6.7 - 500 | Henning, Mutschke (1997) Astron. Astrophys. 327, 743 | |
cryst. | quartz | n,k [fig] | 5 - 24 | Mustard, Hays (1997) Icarus 125, 145. | |
. | SiO2 | refr.ind. | 0.38 - 0.8 | Poenar, Wolffenbuttel (1997) Appl. Opt. 36, 5122 | |
. | silica | . | . | Ghosh, Yajima (1998) J. Lightware Techn. 16, 2002 | |
fused | silica | refr.ind. (T) | 0.19 - 0.196 | Gupta et al. (1998) Appl. Opt. 37, 5964 | |
fused | silica | refr.ind. (c) | 0.351,0.527,1.053 | Milam (1998) Appl. Opt. 37, 546 | |
glas. | SiO2 | n | infrared | Tan (1998) J. Non-Cryst. Sol. 223, 158 | |
cryst. | quartz | appr. | IR? | Ghosh (1999) Opt. Comm. 163, 95 | |
glas. | SiO2 | n | infrared | Tan (1999) Physica B 262, 98; J. Non-Cryst. Sol. 249, 51 | |
. | SiO2 | . | . | Vergohl et al. (1999) Thin Sol. Films 351, 42 | |
alpha | quartz | abs.sp. [fig] | 0.06 - 0.25 | Chang et al. (2000) Phys. Rev. Lett. 85, 2613 | |
amor. | silica | sp. [fig] | 7 - 100 | Fabian et al. (2000), Astron. Astrophys. 364, 282. | |
amor. | SiO2 | n,k | 0.77 - 1.1 | Gunde (2000) Physica B 292, 286 | |
fused | silica | . | . | Murphy, Flavin (2000) Appl. Opt. 39, 4607 | |
amor. | SiO2 | refr.ind. | infrared | Ortiz et al. (2000) Thin Sol. Films 368, 74 | |
ion-irrad. | SiO2 | refr.ind. | . | Swart et al. (2000) Nucl. Instr. Meth. Phys. Res. 166-7, 171 | |
glas. | SiO2 | n (T) [fig] | 1.44 - 4.77 | Tan, Arndt (2000) J. Phys. Chem. Solid. 61, 1315. | |
fused | silica | . | . | Ekvall et al. (2001) Opt. Lett. 26, 896 | |
fused | silica | refr. ind. | vis. | Hlubina (2001) Opt. Comm. 193, 1. | |
glas. | silica | n [tab] | 1.31 - 4.84 | Tan, Arndt (2001) J. Phys. Chem. Solid. 62, 1087. | |
fused | silica | refr.ind. | . | Obata et al. (2002) Opt. Lett. 27, 330 | |
. | SiO2 | n,k | very wide | Zollner et al. (2002) Am. Phys. Soc. Meet., U12.009 | |
amorphous | SiO2 (Lancaster) | absorption coefficients [fig] transmission [fig] |
100μm - 2mm (5-100cm-1) | Boudet et al. (Jul-05) ApJ | |
amorphous | SiO2 | Qext [fig.] | 8-10 | Tamanai et al. (2006) J. Quant. Spectrosc. Radiat. Transfer | |
- | α-Quartz | 10-50 μm(MIR) | Reflection [fig.] | 300-900K | S. Zeidler et al.(2013) Astronomy & Astrophysics, Volume 553, id.A81, 15 pp. |
- | quartz | Reflectance[fig.] | 3-6 μm | - | Thompson, M.S. et al. (2020) Icarus, Volume 346, article id. 113775 |
state: amor. - amorphous, cryst. - crystalline, glas. - glassy, hydr. - hydrous/hydrated.
data: abs - absorption, abs.c. - absorption coefficient, disp.par. - dispersion parameters, e1,2 - dielectric function, ext. - extinction, m.abs.c. - mass absorption coefficient, n,k - refractive index, o,e - ordinary/extraordinary ray, photoem. - photoemission, refl. - reflectance, transm. - transmittance; (T) - dependence on temperature; [fig] - figure, [tab] - table, [t+f] - table and figure, (c!) - compilation.
-
See the pages of Ioffe Institute for
the detailed information on physical characteristics of
silicon.
- See the pages of Crystran Ltd for the optical, physical and chemical characteristics of silicon, crystal quartz, and silica glass.